Metal-Oxide Based High-k Dielectrics and Semiconductors for Thin-film Transistors (09/10/23)

Speaker and Affliation:

Dr. Bukke Ravindra Naik
Assistant Professor, Indian Institute of Technology Mandi


9th October, 2023 (Monday), 10:30 AM (India Standard Time)


K I Vasu Auditorium, Dept. of Materials Engineering, IISc, Bangalore

Biographical sketch:

Dr. Bukke Ravindra Naik, is presently serving as an Assistant Professor at the Indian Institute of Technology Mandi since March 2023. Prior to this role, he held the position of a Mobile Display B/P Process Development Engineer at Samsung Display Co. Ltd. in Suwon, South Korea from April 2022 to February 2023. Dr. Ravindra completed his Ph.D. at Kyung Hee University, Seoul, South Korea, from March 2018 to February 2022. He obtained his B.Tech degree in Materials Science and Engineering from the Indian Institute of Technology Kanpur. Dr. Ravindra was honored with the “Best Thesis Award” for his exceptional Ph.D. work and received the “Outstanding Researcher Award” from Brain Korea, Korean Government, in 2021. His research primarily focuses on metal oxide semiconductors and high-k dielectrics for flexible electronics. In his previous research, he has published 26 journal articles in various esteemed SCI journals, holds 2 patents, and has contributed to 9 international conference proceedings.

Abstract of Talk:

The presentation highlights metal oxide-based High-k gate dielectric materials (e.g., ZrOx, AlOx) and semiconductors (IZTO, IGZTO, ZnO, doped-ZnO, CuGaSnSO), focusing on their applications in thin-film transistors (TFT) and low-cost, low power consumption Complementary metal oxide semiconductors (CMOS) for next-gen flexible displays. Also, Dr. Ravindra will talk about challenges like leakage current, hysteresis, stability under bias stress, and long-term environmental stability in solution- processed oxide TFTs.